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Revealing the atomic structure of the buffer layer between SiC(0001) and epitaxial graphene

机译:揭示siC(0001)与siC之间缓冲层的原子结构   外延石墨烯

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摘要

On the SiC(0001) surface (the silicon face of SiC), epitaxial graphene isobtained by sublimation of Si from the substrate. The graphene film isseparated from the bulk by a carbon-rich interface layer (hereafter called thebuffer layer) which in part covalently binds to the substrate. Its structuraland electronic properties are currently under debate. In the present work wereport scanning tunneling microscopy (STM) studies of the buffer layer and ofquasi-free-standing monolayer graphene (QFMLG) that is obtained by decouplingthe buffer layer from the SiC(0001) substrate by means of hydrogenintercalation. Atomic resolution STM images of the buffer layer reveal that,within the periodic structural corrugation of this interfacial layer, thearrangement of atoms is topologically identical to that of graphene. Afterhydrogen intercalation, we show that the resulting QFMLG is relieved from theperiodic corrugation and presents no detectable defect sites.
机译:在SiC(0001)表面(SiC的硅面)上,通过从基板升华Si获得外延石墨烯。石墨烯膜通过富碳界面层(以下称为缓冲层)与主体分离,该界面部分共价键合到基材上。其结构和电子性能目前正在争论中。在目前的工作中,对缓冲层和准自立式单层石墨烯(QFMLG)进行了端口扫描隧道显微镜(STM)研究,该石墨烯是通过氢插入使缓冲层与SiC(0001)基板脱耦而获得的。缓冲层的原子分辨率STM图像显示,在该界面层的周期性结构褶皱内,原子的排列在拓扑上与石墨烯相同。氢嵌入后,我们表明,所得到的QFMLG可从周期性波纹中释放出来,并且没有可检测到的缺陷部位。

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